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Kla-tencor Announces The Launch Of The Flashscan ? Product Line For Optical And Euv Blank Enclosures

KLA-Tencor announces the launch of the new FlashScan ™ blank mask * detection product line. Since the launch of the first inspection system in 1978, KLA-Tencor has been a major supplier of pattern mask inspection, and the new FlashScan product line has announced that the company has entered a dedicated blank mask inspection market. The manufacturer of the mask blanks is required for the detection of blank blanks for process development and defect detection during mass production. In addition, the photomask manufacturer ("mask factory"), in order to carry out mask inspection, And process control also need to purchase the detection system. The FlashScan system can check blank blanks for optical or extreme ultraviolet (EUV) lithography.


"Advanced lithography technology begins with a well-characterized blank mask." KLA-Tencor's mask and general manager of the Wideband Plasma Wafer Inspection Division, Dr. Xiong Yalin, pointed out that "defective EUV mask blanks are extremely difficult to manufacture, Pushing up production costs and postponing the benefits of EUV lithography for next-generation chip manufacturing. Our new FlashScan blank mask detector captures various types of defects on bare substrates, absorptive films, and photoresist coatings In addition, compared to other systems on the market today, the FlashScan system has higher throughput and sensitivity, which will shorten the learning cycle time of blank mask manufacturers and photomask plants.


Using the laser scattering technology of the KLA-Tencor wafer defect detection system, the FlashScan system meets all current requirements for developing and producing optical and EUV blank enclosures for sensitivity and detection speed. The system utilizes a unique three-channel data acquisition system for the mask detection system, which allows detection of defects in various types of mask blanks, dimensional measurements and differentiation, such as possible during photomask production or transport Pinhole and drop particles.


The leading mask factory shows a strong interest in high-sensitivity, high-volume and all-type defect detection systems, demonstrating the market's demand for the product. The FlashScan system is powered by the KLA-Tencor Global Integrated Services network to ensure the excellent performance and throughput required for blank and pattern mask manufacturers.


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